The KOBUS product line offers single wafer deposition solution. Addressing R&D and production customers with dedicated solution, we propose a unique portfolio of deposition methods using F.A.S.T. and PECVD technologies.
Fast Atomic Sequential Technology
At the crossroads of CVD and ALD deposition techniques, F.A.S.T.® proposes:
- Unique film properties;
- Best in class solution for Thick and Conformal layers;
- ALD film performances at CVD speed.
Based on F.A.S.T. technology we offer:
KOBUS has also developped mature process deposition solution: