Before developing the F.A.S.T. technique, KOBUS has been providing deposition tools.
For the last 10 years, the PECVD tools were developed to reach today’s state of the art.
KOBUS Silane process module is being used for deposition of Silane based oxide, nitride and oxinitride films, as well as amorphous silicon, micro-cristalline silicon and amorphous silicon carbide. With dual RF plasma assistance, it combines capabilities to use mature processes for solution optimized to customer.
KOBUS TEOS has been developed for undoped and doped silicon oxides. Using dual RF plasma enhanced CVD (PECVD), it delivers mature process deposition to customer specific requirements keeping production standard.