KOBUS has developped a unique deposition method at the crossroads of ALD and CVD: F.A.S.T. for Fast Atomic Sequential Technology.
Based on proprietary CVD reactor design, combined with pulsed capability, it is optimal for thick and conformal layer deposition and offers new solutions for 3D integration challenges.
KOBUS missions are to develop highly efficient cost effective CVD technologies used for R&D, pilot and manufacturing of semiconductor, LEDs, MEMS and photovoltaic devices. KOBUS offers a unique portfolio of equipments for both mature and advanced materials deposition.
Since its creation, KOBUS, and before that Altatech, has continued to grow by cultivating innovation and creating solutions tailored to our customer’s specific needs.
Today KOBUS develops a unique portfolio of technologies – including standard and customized equipment and expertise.